Random Aperture and Pattern Refractive Microlens Array
Coligh utilizes advanced photolithography machines for etching and manufacturing Random Aperture and Pattern Refractive Microlens Arrays. By combining random function design with high-precision microstructure processing, random refractive lenses can achieve higher light uniformity in applications such as laser beam homogenization, wavefront disturbance, and scattering diffusion
Sub-lens shape Random
- Lens arrangement: Random
- Lens type Refractive: plano-convex
- Pitch accuracy: ± 1 μm
- Application: Beam homogenization, wavefront perturbation
Random Aperture Micro Lens Arrays Key Features
- In the random micro-array lens, the shape of each sub-lens is random, no longer a fixed geometric figure, and no longer any symmetrical or regular form. This irregular shape can be more flexible in beam shaping and light field modulation. And it can adapt to a variety of optical applications, and can be realized as fine-tuning dispersion, scattering and focusing of the light beam.
- In the random micro-array lens, the position of each lens in the lens array is randomly divided, and the spacing and arrangement order between the lenses are not fixed. In this way, the light field can be more uniform, the optical system adjustment can be more delicate, and the optical distortion can be reduced by precisely controlling the density and distribution of the random arrangement.
- The type of lens is plano-convex refractive type. This design enables it to achieve more effective refraction of the light beam and achieve lower optical loss. The larger numerical aperture of the plano-convex lens can capture more light.
- The combination of random arrangement and random shape can realize beam shaping and focusing mode conversion in irregular space, and can control and optimize the light beam, eliminating the interference caused by regular arrays in traditional optical systems.
Fused Silica Refractive Microlens Array Random Sub aperture Random Arrangement Product Series:
| Product No. | Pitch | EFFL. | Dim. | Thick | Wavelength | N.A. |
|---|---|---|---|---|---|---|
| MRLQ(RDM)-010 | 10.0μm | 2,00 | 10×10 | 1 | 0.6328μm | 354,00 |
How Coligh Utilize Lithographically manufacturing:
- Optical simulation software Zemax is used to perform random lattices, and random layouts are generated using models such as random function algorithms, Poisson lattices, and Gaussian perturbations. Energy uniformity simulation, wavefront perturbation simulation, and scattering angle simulation can be performed to control the distribution of maximum and minimum apertures, spacing, and focal lengths.
- Using laser direct writing, a quartz mask plus a Cr film is used to generate a high-precision photomask
- Photolithography (fused quartz, single crystal silicon, float glass, etc. as substrates, and UV exposure)
- Etching (reactive ion etching)
- Use thermal reflow and ion beam nanopolishing to optimize the surface of silicon or quartz to improve imaging quality
- Coating Optimize the coating of anti-reflection films, reflective films, and filter films within the range of 200-20um
- Laser cutting combined with mechanical cutting to control the cutting size and perform packaging or device integration
Random Aperture and Pattern Refractive Microlens Array Manufacturing Capability
| Item | Custom Specification |
|---|---|
| Wavelength Range | 200 nm – 20 μm |
| Material Options | Fused Silica, Monocrystalline Silicon, PMMA |
| Microlens Shape | Square, Round, Spherical, Aspherical, Freeform |
| Sub-aperture Size | 10 μm – 1500 μm |
| Diffraction Efficiency | Up to 80% – 90% |
| Focal Length | Supports both short and long focal lengths |
| Phase Levels | 8-level and above, continuous phase available |
| Overall Size | Diameter 1.5 mm – 4 inch |
| Thickness | Flexible (any thickness) |
| Coating | AR or HR coatings available for 200 nm – 20 μm |
| Beam Shape | Round, Square, or Custom Freeform |
| Dot Array | Up to 33 × 33 |
| Applications | Fiber Coupling, Beam Calibration, Imaging |
How Coligh Testing and quality control on Randome Microlens
- One-dimensional step profile test
One-dimensional step meter can measure the surface morphology of microlens array to ensure that the surface of each lens meets the shipping standards - Three-dimensional profile test
Three-dimensional profile meter can check the three-dimensional structure of microlens array, especially suitable for microlens array with complex structure. We can use three-dimensional profile meter to check the size, shape and other information of lens array surface - Spherical surface measurement:
Interferometer: We use interferometer to check the surface profile and wavefront error of lens array.
Spectrophotometer: We use spectrophotometer to check the transmittance and reflectance of ultraviolet, visible and infrared bands, and evaluate the optical performance of microlens array
More about Coligh’s micro-nano processing technology: photolithography and laser direct writing
- In different application scenarios, we apply different micro-nano processing technologies. In addition to core photolithography technology, we can also provide laser direct writing.
- For small batches or customized production, we use laser direct writing technology to complete. We can provide customized and flexible services for experimental fields
- For mass production, we can make masks ourselves and mass produce for industrial fields such as semiconductors and microelectronics
Why are randomly arranged microarray lenses with random apertures needed?
- Random microarray lenses can reduce the periodic interference and moiré patterns associated with traditional regularly arranged lenses, resulting in a more uniform light field distribution.
- Random microarray lenses offer more precise and flexible light field control, enabling more uniform illumination distribution.
- Â Random microarray lenses can reduce the concentration effect in regular arrays, resulting in a more uniform light field distribution, while also minimizing energy loss caused by uneven light beams.
- Random microarray lenses can be used in complex optical imaging systems such as super-resolution microscopy and lidar to regulate the uniformity of the light source.








