A random phase plate is an optical element that is machined from fused silica or optical glass into a structure with a random phase distribution and small height variations. The random height variations of these surface nano-retardations generally follow a Gaussian or uniform distribution and introduce a statistically random phase delay to the incident laser. The central role of the random phase plate is to achieve beam homogenization, uniform scattering, disruption of beam space coherence and wavefront shaping. By destroying the coherence of the beam and diffraction effects, a top-hat light intensity distribution can eventually be generated in the far field or in the focal plane of the lens. It is generally used in laser homogenization, beam decoherence, high quality imaging projection and random scatter generation for laser material processing, laser display, and bio-imaging applications.
We use fused silica material, fused silica optical performance is stable, high temperature resistance, anti-laser damage, chemical stability, suitable for high power laser.
The structure of round hole phase is very suitable for wavefront shaping and beam shaping, which can avoid the interference of fringe diffraction, make the output uniform spot and reduce stray light.
431.2nm such a phase depth is very precise, can efficiently break up the wavefront coherence, enhance the homogenization of laser light
4.405nm center wavelength is specially designed for blue-violet lasers, which can be used for UV lithography, fluorescence excitation sources, and so on.
It can be customized according to the specific light source wavelength, phase distribution, depth, correlation length and other parameters can be customized according to the customer’s application needs.
Standard randomized phase plate product line:
Capability
Specification
Lens Cell Shapes
Circular, Square, Hexagonal, Freeform
Material Options
Fused Silica, Monocrystalline Silicon, Optical Glass, PMMA Polymer, Metal
Coating
AR Coating from UV (200 nm) to IR (20 μm)
Overall Size Range
1.5 mm to 4 inch
Micro Lens Pitch
10μm -1500 μm
Service Scope
Structural Design, Material Selection, Optical Simulation, Prototyping,
Mass Production, System Integration
Our Customization Capabilities for Random Phase Plates (RPPs)
Random Phase Plates are highly customizable products, and with our advanced micro-nanofabrication capabilities, we are able to design and customize them to meet the needs of our customers.
Specification
Capability Description
Wavelength Range
≥ 200 nm (customizable to any wavelength above 200 nm)
Size
1.5 mm to 4–6 inches
Substrate Material
Fused silica, sapphire, silicon, or other optical glass
Phase Depth
≥ 100 nm
Microstructure Shape
Circular, trapezoidal, sawtooth, conical, random relief, multi-step
Phase Modulation Type
Continuous or discrete
Phase Distribution
Gaussian, uniform, Poisson, or user-defined
Thin Film Coating
Double-sided anti-reflection (AR) coating
Advantages of Photolithography Random Phase Plates
We use photolithography to process random phase plates, which has the following advantages:
The processing precision of lithography is all in nanometer and sub-nanometer level, which can achieve the microstructure with high processing precision.
The lithography process can control the depth and high speed of each microstructure to realize random phase distribution, and can control the complex three-dimensional surface shape.
It has a very high surface beam and very low roughness, which can reduce the scattering damage and laser damage caused by defects and roughness.
Photolithography through complex simulation and optimization, the design of the random pattern can efficiently destroy the coherence, inhibit scattering and interference noise
high-precision photolithography process can ensure the consistency of mass production
According to the customer’s application and system, analyze the light source, angle of incidence, target spot, working wavelength and power
According to the different statistical distribution model to generate the phase perturbation: Gaussian, Uniform, Poisson, customized
Our scientists can simulate the output effect of the phase plate in different conditions and working conditions according to the system requirements
According to the requirements of the micro and nanostructures to confirm the parameters of the processing and precision
Randome Phase Plate Applications:
Semiconductor Lithography Illumination Systems
Random Phase Plates are integrated into the core optical path of lithography illumination systems to solve the problems of scattering, interference fringing, uneven wafer processing, etc. due to coherence, and to minimize graphic aberrations and defects.
Laser Projection
When used in a projector, a random phase plate can solve the problem of strong scattering interference caused by the high coherence of the laser light, destroying the generated scatter pattern, and combining the vibration of the screen and beam scanning to achieve the best projection results.
Laser Material Processing
In laser welding, laser annealing, laser surface treatment, the random phase plate will be used in conjunction with other components, so as to achieve uniformity of the laser spot energy, and to improve the quality and stability of the laser processing. Quality and Stability
