193nm DUV Hard Coated UV Filter FWHM 20nm
193nm DUV Hard Coated UV Filter FWHM 20nm is DUV Deep Narrowband UV Transmitting Filter. Coligh customs and manufactures high quality UV bandpass filters cover from 160nm in China
193nm DUV Hard Coated UV Filter FWHM 20nm Overview
The 193/20 nm UV filter features a center wavelength of 193 nm and a bandwidth (FWHM) of 20 nm; it is specifically designed for 193 nm ArF excimer laser systems and other deep-UV optical instruments. It effectively transmits DUV signals while providing deep blocking across the 170–1200 nm range. By utilizing high-purity fused silica combined with hard dielectric coating technology, the filter offers an exceptionally high laser damage threshold and long service life, making it widely suitable for applications such as semiconductor inspection and ophthalmic medical lasers.
The spectrum Curve Of 193nm DUV Hard Coated UV Filter FWHM 20nm

193nm DUV Hard Coated UV Filter FWHM 20nm Technical Specifcation
- Centerwavelength: 193+/-3nm
- FWHM: 20+/-3nm
- Transmission Peak >13%
- Blocking depth: 170-1200nm@OD3 average
- Standard Size in stock: Dia25.4*6mm
Hard Coated UV Filter In Stock List:
| Center wavelength +/-2nm | FWHM nm | Transmission (T%) | Blocking range | Blocking depth | Size avaliable |
|---|---|---|---|---|---|
| 185nm | 20nm | T>13 | 170-1200nm | averageOD3 | D25.4*6mm |
| 193nm | 20nm | T>13 | 170-1200nm | averageOD3 | D25.4*6mm |
| 200nm | 20nm | >15% | 170-1200nm | averageOD3 | D25.4*6mm |
| 214nm | 10nm | >13% | 200-1200nm | OD3-OD4 | D12.7*6mm |
| 214nm | 20nm | >18% | 200-1200nm | OD3-OD4 | D25.4*6 |
| 216nm | 10nm | >14% | 200-1200nm | OD3-OD4 | D9*3mm D12.7*6mm |
| 218nm | 8nm | >14% | 200-1200nm | OD3-OD4 | D25.4*6mm |
| 220nm | 10nm | >14% | 200-1200nm | OD3-OD4 | D9*3mm D10*6mm D12.7*6mm D25.4*6mm |
| 220nm | 15nm | >14% | 200-1200nm | OD3-OD4 | D12.7*6mm D25.4*6mm |
| 220nm | 20nm | >14% | 200-1200nm | OD3-OD4 | D12.7*6mm |
| 223nm | 10nm | >14% | 200-1200nm | OD3-OD4 | D12.7*6mm |
| 225nm | 10nm | >15% | 200-1200nm | OD3-OD4 | D12.7*6mm |
| 228nm | 10nm | >15% | 200-1200nm | OD3-OD4 | D12.7*6mm |
| 230nm | 10nm | >18% | 200-1200nm | OD4 | D12.7*6mm D25.4*6mm |
| 240nm | 10nm | >20% | 200-1200nm | OD4 | D12.7*6mm D25.4*6mm |
| 240nm | 10nm | >40% | 200-1200nm | OD3 | D12.5*3.5mm D25*3.5mm |
| 240±3nm | 10nm | >25% | 200-1200nm | OD4 | M62mm |
| 246nm | 10nm | >25% | 200-1200nm | OD4 | D12.7*6mm D25.4*6mm |
| 248nm | 10nm | >25% | 200-1200nm | OD4 | D12.7*6mm D25.4*6mm |
| 250nm | 10nm | >25% | 200-1200nm | OD4 | D25.4*6mm |
| 250nm | 10nm | >25% | 200-1200nm | OD4 | D25.4*6mm |
| 254nm | 10nm | >25% | 200-1200nm | OD4 | D12.7*6mm D25.4*6mm |
| 254nm | 10nm | >40% | 200-1200nm | OD3 | D7.3*3mm |
| 254nm | 15nm | >25% | 200-1200nm | OD4 | D9*3mm D12.7*6mm D15*2.6mm D25.4*6mm |
| 258nm | 10nm | >25% | 200-1200nm | OD4 | D12.7*6mm D25.4*6mm |
| 260nm | 10nm | >25% | 200-1200nm | OD4 | D7.3*3mm |
| 260nm | 10nm | >25% | 200-1200nm | OD4 | D12.7*6mm D25.4*6mm |
| 260±3nm | 15nm | >25% | 200-1200nm | OD4 | D12.7*6mm |
| 265nm | 10nm | >25% | 200-1200nm | OD4 | D12.7*6mm D25.4*6mm |
| 265±3nm | 25nm | >25% | 200-1200nm | OD4 | D25.4*6mm |
| 260nm | 10nm | >25% | 200-1200nm | OD4 | D25.4*6mm |
| 268nm | 10nm | >25% | 200-1200nm | OD4 | D25.4*6mm |
| 270nm | 10nm | >25% | 200-1200nm | OD4 | D9*3mm D12.7*6mm D25.4*6mm |
| 270nm | 10nm | >25% | 200-1200nm | OD4 | D9*3mm |
| 275nm | 10nm | >25% | 200-1200nm | OD4 | D12.7*6mm |
| 275nm | 10nm | >25% | 200-1200nm | OD4 | D9*3mm D10*6mm D12.7*6mm D25.4*6mm |
| 275±3nm | 15nm | >25% | 200-1200nm | OD4 | D12.7*6mm D25.4*6mm |
| 278±3nm | 20nm | >25% | 200-1200nm | OD4 | D12.7*6mm D25.4*6mm |
| 275±3nm | 30nm | >30% | 200-1200nm | OD4 | D12.7*6mm D25.4*6mm |
| 280nm | 10nm | >25% | 200-1200nm | OD4 | D9*3mm D12.7*6mm D25.4*6mm |
| 280nm | 14nm | >26% | 200-1200nm | OD4 | D12.7*6mm D25.4*7mm |
| 280nm | 6nm | >20% | 200-1200nm | OD4 | D6.3*1mm D12.7*6mm |
| 285 | 15nm | >30% | 200-1200nm | OD4 | D12.7*6mm |
| 288nm | 12nm | >25% | 200-1200nm | OD4 | D12.7*6mm |
| 295nm | 7nm | >25% | 200-1200nm | OD4 | D12.7*6mm D25.4*6mm |
| 200-1200nm | OD4 | ||||
| 300nm | 8nm | >25% | 200-1200nm | OD4 | D12.7*6mm D25.4*6mm |
| 310nm | 14nm | >30% | 200-1200nm | OD4 | D25.4*6mm |
| 300nm | 10nm | >25% | 200-1200nm | OD4 | D8*3mm |
| 256nm | 8nm | >55% | 200-650nm | OD3 | D49*2mm |
| 260nm | 10nm | >45% | 200-650nm | OD4 | D12.7*6mm D25.4*6mm |
| 260nm | 10nm | >45% | 200-650nm | OD4 | D12.7*6mm D25.4*6mm |
| 260nm | 15nm | >50% | 200-650nm | OD4 | D12.7*6mm |
| 260nm | 40nm | >75% | 200-650nm | OD4 | D11*2mm D25*2mm D27.2*2mm |
| 265nm | 10nm | >50% | 200-650nm | OD4 | D12.7*6mm D25.4*6mm |
| 265nm | 25nm | >55% | 200-650nm | OD4 | D25.4*6mm |
| 268nm | 10nm | >55% | 200-650nm | OD4 | D25.4*6mm |
| 270nm | 10nm | >55% | 200-650nm | OD4 | D25.4*6mm |
| 270nm | 40nm | >75% | 200-650nm | OD4 | D24*2mm D27.2*1.5mm |
| 275nm | 10nm | >65% | 200-650nm | OD4 | D12.7*6mm D25.4*6mm |
| 275nm | 15nm | >65% | 200-650nm | OD4 | D12.7*6mm D25.4*6mm |
| 275nm | 30nm | >65% | 200-650nm | OD4 | D12.7*6mm D25.4*6mm |
| 278nm | 20nm | >65% | 200-650nm | OD4 | D12.7*6mm |
| 280nm | 10nm | >75% | 200-650nm | OD3 | 5*5*2mm |
| 280nm | 10nm | >65% | 200-650nm | OD4 | D25.4*6mm |
| 280nm | 6nm | >50% | 200-650nm | OD4 | D12.7*6mm |
| 285nm | 15nm | >65% | 200-650nm | OD4 | D12.7*6mm |
| 288nm | 12nm | >65% | 200-650nm | OD4 | D12.7*6mm |
| 288nm | 15nm | >70% | 200-650nm | OD4 | D6*1mm |
| 295nm | 7nm | >50% | 200-650nm | OD4 | D25.4*6mm |
| 300nm | 8nm | >65% | 200-650nm | OD4 | D25.4*6mm |
| 310nm | 14nm | 200-650nm | OD4 | D25.4*6mm | |
| 300nm | 40nm | >75% | 200-700nm | OD3 | D24*1mm |
| Wide band UV bandpass filter | FWHM nm | Transmission (T%) | blocking range | Blocking depth | Size avaliable |
| T>85 at235-310nm | 80nm | T>85 | 200-355nm | OD5 | D50.8*3mm |
| T40% at250-350nm | 100nm | T40% | 200-1100nm | OD4 | D25.4*6mm |
| Tave80% at270-375 | 100nm | Tave80% | 200-950nm | OD3 | D25.4*6mm |
| T>85 at 280-380nm | 100nm | T>85 | 200-650nm | OD4 | D25.4*6mm |
193nm DUV Hard Coated UV Filter FWHM 20nm Applications
Semiconductor Photolithography and Wafer Inspection
193 nm is the standard light source wavelength for ArF immersion lithography systems. In photomask and wafer surface inspection, a 193/20 nm VUV filter serves as an optical window that transmits the 193 nm inspection signal while blocking background light interference, thereby enhancing contrast and the signal-to-noise ratio.
Ophthalmic Excimer Laser Surgery
193 nm ultraviolet light can break molecular bonds in corneal tissue, allowing for corneal ablation without causing thermal damage. A 193/20 nm UV filter transmits the ArF output spectral line while blocking stray light, ensuring a stable output of surgical laser energy.
Laser Ablation
193 nm excimer lasers can ablate materials such as fused silica, calcium fluoride, and metals, making them suitable for applications in geochronology and materials analysis. A 193/20 nm VUV filter acts as an observation window for the ablation chamber, isolating the 193 nm working laser beam and protecting the detector from damage caused by stray light.







