220nm High Transmission UV filter FWHM 10nm Overview

The 220nm High-Transmission UV Filter (FWHM 10nm) is a deep-UV bandpass filter featuring a center wavelength of 220nm and a full width at half maximum (FWHM) of 10nm. It offers a blocking depth of OD3 to OD4 across the 200–1200nm range, effectively isolating stray light outside the target band and preventing spectral crosstalk from adjacent wavelengths. This filter is suitable for applications in biochemical analysis, environmental gas detection, and systems utilizing 222nm excimer light sources.

The spectrum Curve Of 220nm High Transmission UV filter FWHM 10nm

220nm High Transmission UV filter FWHM 10nm Technical Specifcation

• Centerwavelength: 220+/-2nm
• FWHM: 10+/-2nm
• Transmission Peak >15%
• Blocking depth: 200-1200@OD3-OD4 average
• Standard Size in stock: Dia9*3mm Dia10*6mm Dia12.7*6mm Dia25.4*6mm or custom

Other High Transmission UV Filter In Stock List:

Coligh Custom capability of UV bandpass filters

• Custom different center wavelength
• Custom different FWHM
• Custom special angle of incidence
• Custom shape and dimention
• Custom option for mounting

220nm High Transmission UV filter FWHM 10nm  Applications

Nitric Oxide Monitoring

The characteristic absorption peaks of nitric oxide gas are concentrated around 214 nm and 226 nm. In industrial exhaust streams where other gases are typically present, a 220/10 nm high-transmission UV filter can be integrated into the gas probe to detect nitric oxide while rejecting interference from gases absorbing at other wavelengths.

Trace Biochemical Analysis

In applications such as protein purification, peptide synthesis, and nucleic acid analysis, 220 nm is a critical wavelength for detecting the characteristic signals of peptide bonds. A 10 nm narrow bandwidth offers high transmission and an out-of-band blocking depth of OD3–OD4; this enables the detection of weak transmitted signals while effectively blocking fluorescence and stray light at other wavelengths.

Semiconductor Manufacturing

222 nm excimer light sources are increasingly used in semiconductor wafer cleaning, surface modification, and human-safe deep-UV sterilization. A 220/10 nm UV bandpass filter can serve as the light source’s output window, transmitting the primary peak while blocking other associated ultraviolet and visible light.