240 nm DUV Bandpass Filter FWHM 20nm Fused Silica Substrate Overview

Coligh, a manufacturer of UV optical filters, specializes in providing R&D, prototyping, customization, and mass production services for UV bandpass filters to customers in research, industry, and equipment. This 240nm DUV bandpass filter features a center wavelength of 240nm, a half-bandwidth of 20nm, and high transmittance in the 230-250nm range. Constructed from a fused silica substrate and a rigid dielectric film, it exhibits low absorption, low autofluorescence, and good thermal stability. It is suitable for applications requiring deep UV transmission and narrow bandwidth, such as UV spectrophotometers, spectrometers, fluorescence detection, bioanalysis, UV imaging, and environmental monitoring

The spectrum Curve Of 240 nm DUV Bandpass Filter FWHM 20nm Fused Silica Substrate

240 nm DUV Bandpass Filter FWHM 20nm Fused Silica Substrate Technical Specifcation

• Centerwavelength: 240+/-3nm
• FWHM: 20+/-3nm
• Transmission Peak >20%
• Blocking depth: 200-1100@OD4 average

Other Deep UV Dielectric filter and UV Bandpass Filter In Stock List:

Why Choose Coligh For your UV Dielectric filter Project and Application

1. We can handle everything from membrane system design to finished product shipment within a short timeframe, typically within two weeks.
2. Currently, we can develop UV narrowband filters in the 160-400nm range.
3. For UV bandpass filters, we offer two coating options: rigid dielectric multilayer films and metal films, depending on customer requirements.
4. We have a large inventory with high customization consistency, suitable for research prototyping, small-batch pilot production, and mass production.

Coligh Custom capability of UV Optical bandpass filters

• Custom different center wavelength
• Custom different FWHM
• Custom special angle of incidence
• Custom shape and dimention
• Custom option for mounting

240 nm DUV Bandpass Filter FWHM 20nm Fused Silica Substrate  Applications

Ultraviolet Spectroscopy Analysis

The area around 240 nm often corresponds to absorption peaks or characteristic spectral lines of certain substances. However, ultraviolet light sources typically contain continuous spectrum, visible light, and near-infrared stray light. Using a deep ultraviolet bandpass filter with 240 nm and FWHM 20 nm can select the target wavelength while suppressing interference from other wavelengths. Fused silica substrates exhibit low absorption and low fluorescence in the deep ultraviolet region, making them suitable for this type of detection. Furthermore, it can improve the spectral signal-to-noise ratio and reduce stray light errors.

Ultraviolet Fluorescence Detection

In fluorescence detection, the sample needs to be excited with ultraviolet light near 240 nm. Simultaneously, it is crucial to suppress the excitation light from entering the fluorescence channel; otherwise, background noise will mask weak signals. The low fluorescence characteristics of fused silica substrates reduce self-luminescence interference, and FWHM 20 nm helps isolate the target excitation band, reducing background noise and improving fluorescence detection sensitivity and the ability to identify weak signals.

Solar-Blind Ultraviolet Imaging

The solar background radiation is low in the solar-blind ultraviolet band. The area around 240 nm can be used to capture weak ultraviolet signals such as corona discharge and electrical discharge. Using a 240 nm, FWHM 20 nm bandpass filter allows the target ultraviolet signal to pass through while suppressing visible light and near-infrared background, improving imaging contrast.

Ambient Gas Detection

Some gases exhibit absorption or fluorescence characteristics around 240 nm, but various gases and broadband light sources in the environment can interfere, such as NO₂, SO₂, and O₃. A 240-20 nm narrowband ultraviolet filter can isolate the target wavelength, improving gas selectivity. This reduces cross-interference and is suitable for online monitoring and portable analysis.